sub- 3ns脉冲与sub-100µA切换1x-2x nm垂直MTJ,用于高性能嵌入式STT-MRAM向sub-20 nm CMOS

D. Saida, S. Kashiwada, Megumi Yakabe, T. Daibou, Naoki Hase, M. Fukumoto, S. Miwa, Yoshishige Suzuki, H. Noguchi, S. Fujita, J. Ito
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引用次数: 24

摘要

研制了一种新型的垂直磁隧道结(MTJ),它可以在1 ns左右的脉冲宽度和小于100 μA的电流下切换。本文首次展示了快速开关,低功耗操作和写入电流尺寸可扩展到16 nm直径的MTJ的新成就。这个MTJ满足缓存中通常需要的保留。测试结果表明,我们提出的MTJ可以为在sub- 20nm CMOS生产中嵌入STT-MRAM开辟一条道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sub-3 ns pulse with sub-100 µA switching of 1x–2x nm perpendicular MTJ for high-performance embedded STT-MRAM towards sub-20 nm CMOS
A novel perpendicular magnetic tunnel junction (MTJ) is developed that can be switched using pulse widths of around 1 ns and currents of less than 100 μA. This paper presents the first demonstration in novel achievement of fast switching, low power operation and size scalability of write current down to 16 nm diameter MTJ. This MTJ satisfies retention which is typically required in cache memory. Measurement results show that our proposed MTJ can open a path to embedded STT-MRAM in sub-20 nm CMOS generation.
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