开发低回路、长长度、流体静压挤压焊线

H. Lichtenberger, Gabriel Toea, Michael Zasowski
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引用次数: 1

摘要

近年来微电子领域的发展导致对低回路和长键合线的需求日益增加。为了开发出满足这些需求的产品,我们研究了添加Be、Cu、Ag、Ca、Pt和Al对高纯度5Ns金的影响,并结合静压线材挤压工艺。绘制了不同掺杂水平下的键合断线载荷和再结晶温度。通过优化再结晶温度和强度,实现了低环长金键合线。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Development of low loop, long length, hydrostatically extruded bonding wire
Recent developments in the microelectronics field have led to an increasing need for low loop and long length Bonding Wires. In order to develop a product to meet these needs, we have investigated the effects of Be, Cu, Ag, Ca, Pt and Al additions to high purity 5Ns gold in conjunction with a hydrostatic wire extrusion process. Bonding wire break loads and recrystallization temperatures are plotted for varying levels of these dopants. Low loop and long length Gold bonding wire is achieved by optimizing the chemistry for high recrystallization temperature and strength.
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