从低成本、低分辨率的快速参数测试中估计MOSFET泄漏

S. Saxena, T. Uezono, R. Vallishayee, R. Lindley, A. Swimmer, S. Winters
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引用次数: 1

摘要

介绍了一种利用低成本、低分辨率快速并行参数测试估计MOSFET关断电流亚阈值分量的方法。该方法测量亚阈值斜率,并用它来估计误差。单个晶体管的测量结果表明,测量的ioff和使用我们的方法估计的ioff之间有很好的一致性。对于一个简单的衬垫效率晶体管阵列测试结构,其中未选择的器件会给亚阈值测量增加额外的噪声,阵列中所有晶体管的提取off的总和与测量的阵列off密切相关,即使它与测量的阵列off不匹配。强相关性用于推导校准因子,然后用于估计阵列测试结构中单个晶体管的off。这允许在量产过程中以最小的测试时间开销统计晶体管泄漏特性。描述了统计非状态泄漏特性在IDDQ生产过程良率诊断中的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Estimating MOSFET Leakage from Low-cost, Low-resolution Fast Parametric Test
A method of estimating the subthershold component of MOSFET off-state current (Ioffs) using low-cost, low-resolution fast parallel parametric test is introduced. This method measures the subthreshold slope and uses it to estimate Ioffs. Measurements of individual transistors show a very good agreement between measured Ioffs and Ioffs estimated using our approach. For a simple pad-efficient transistor array test-structure, where unselected devices can add additional noise to the subthreshold measurements, the sum of extracted Ioffs for all transistors in an array is strongly correlated to the measured array Ioffs, even though it does not match the measured array Ioffs. The strong correlation is used to derive calibration factors which are then used to estimate individual transistor Ioffs from array test structures. This allows statistical characterization of transistor leakage during volume production with minimal test time overhead. The applications of statistical off-state leakage characterization to diagnose IDDQ yield problems during production are also described.
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