{"title":"在450°C电沉积铜TSV时不泵送","authors":"K. Kondo","doi":"10.1109/ECTC.2016.337","DOIUrl":null,"url":null,"abstract":"1.The additive A shows no pumping with electrodeposited copper TSV. 2. The resistivity of electrodeposited copper TSV after 450°C annealing for the wiring is only 1.09 of conventional electrodeposited copper. 3.The 34% TEC reduction has been realized at 230°C for solder reflow temperature for PCB. The 34% reduction has been obtained after the second annealing after 200°C, 60min with the additive B. 4.The resistivity of PCB copper after annealing is only 1.32 of conventional electrodeposited copper.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"No pumping at 450°C with electrodeposited copper TSV\",\"authors\":\"K. Kondo\",\"doi\":\"10.1109/ECTC.2016.337\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"1.The additive A shows no pumping with electrodeposited copper TSV. 2. The resistivity of electrodeposited copper TSV after 450°C annealing for the wiring is only 1.09 of conventional electrodeposited copper. 3.The 34% TEC reduction has been realized at 230°C for solder reflow temperature for PCB. The 34% reduction has been obtained after the second annealing after 200°C, 60min with the additive B. 4.The resistivity of PCB copper after annealing is only 1.32 of conventional electrodeposited copper.\",\"PeriodicalId\":343912,\"journal\":{\"name\":\"2016 International Conference on Electronics Packaging (ICEP)\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-08-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 International Conference on Electronics Packaging (ICEP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ECTC.2016.337\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Conference on Electronics Packaging (ICEP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2016.337","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
No pumping at 450°C with electrodeposited copper TSV
1.The additive A shows no pumping with electrodeposited copper TSV. 2. The resistivity of electrodeposited copper TSV after 450°C annealing for the wiring is only 1.09 of conventional electrodeposited copper. 3.The 34% TEC reduction has been realized at 230°C for solder reflow temperature for PCB. The 34% reduction has been obtained after the second annealing after 200°C, 60min with the additive B. 4.The resistivity of PCB copper after annealing is only 1.32 of conventional electrodeposited copper.