当前CMOS技术中光电二极管的性能和设计优化

Weiquan Zhang, M. Chan
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引用次数: 7

摘要

从一个标准的CMOS技术已经研究了各种光电二极管的性质。这些包括光强相关的光电流、通断特性、二极管电容和高响应性的设计优化。我们选择MOSIS HP 0.8 /spl mu/m CMOS技术来制作测试用的光电二极管。在此基础上,讨论了低功耗CMOS成像系统中光电二极管的优化设计方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Properties and design optimization of photo-diodes available in a current CMOS technology
The properties of various photo-diodes available from a standard CMOS technology have been studied. These include light intensity dependent photo-current, turn-on and turn-off characteristics, diode capacitance, and design optimization for high responsivity. The MOSIS HP 0.8 /spl mu/m CMOS technology has been selected to fabricate the test photo-diodes. Based on the results, the methodology to design optimal photo-diodes for low power CMOS imaging system will be discussed.
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