利用光声学测量Cu和Ta薄膜的厚度

Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) Pub Date : 2000-06-05 DOI:10.1109/IITC.2000.854317

M. Gostein, T. Bailey, I. Emesh, A. Diebold, A. Maznev, M. Banet, M. Joffe, R. Sacco

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引用次数: 3

摘要

利用光声脉冲受激热散射技术研制了一种新型的全光学、无损金属膜厚度测量仪器。该技术使用激光来激发和探测样品膜中的声波。在本研究中，评估了一种基于ist的商用仪器用于测量Cu和Ta薄膜，并将结果与四点探针、SEM、TEM和GIXR进行了比较。我们还表明，ist可以与四点探针结合使用，以确定PVD Cu薄膜的电阻率。

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Thickness measurement for Cu and Ta thin films using optoacoustics

New all-optical, nondestructive metrology instruments for metal film thickness measurement have been developed using the opto-acoustic technique impulsive stimulated thermal scattering (ISTS). The technique uses lasers to initiate and detect acoustic waves in the sample film. In this study, a commercial ISTS-based instrument is evaluated for measuring Cu and Ta thin films, and the results are compared with 4-point probe, SEM, TEM, and GIXR. We also show that ISTS can be used in conjunction with 4-point-probe to determine resistivity for thin PVD Cu films.

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Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)

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