p2id2002半导体制程损害产业调查

2003 8th International Symposium Plasma- and Process-Induced Damage. Pub Date : 2003-04-24 DOI:10.1109/PPID.2003.1200934

T. Hook, K. Eriguchi, T. Dao, S. Alba, P. K. Aum

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引用次数: 0

摘要

这是第一次关于P2ID对半导体器件的PID(“过程诱发损伤”)的国际半导体行业调查。P2ID的目的是理解和管理半导体行业面临的PID问题。

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P2ID 2002 industry survey of semiconductor process-induced damage

This is the first international semiconductor industry survey regarding PID ("Process Induced Damage") on semiconductor devices by P2ID. The purpose of P2ID is in understanding and managing PID issues faced by the semiconductor industry.

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2003 8th International Symposium Plasma- and Process-Induced Damage.

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