镀锌对低成本倒装技术中化学镀镍UBM的影响

Yu Yang, Jian Cai, Shuidi Wang, Songliang Jia
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引用次数: 4

摘要

在铝键垫上进行化学镀镍,然后进行焊料碰撞,被认为是低成本倒装芯片技术的一个有前途的解决方案。镀锌是在镍和铝之间形成牢固的导电连接的关键工艺步骤。脱脂和除氧化物处理后粘结垫的形貌略有变化。大的锌粒在锌化过程中生长。为了得到更均匀光滑的锌膜,需要进行第二次镀锌。新沉积的锌膜使倒装芯片互连的附着力更好。因此采用双锌法代替单锌法。表面粗糙度的变化与其形貌相符合。用扫描电镜和原子力显微镜对键合板表面进行了检测。镀锌过程的另一个关键因素是浸浴时间。在本文中,第一次和第二次镀锌的浸泡时间分别为45和15s。在80/spl mu/m/spl × 80/spl mu/m的Al键合板上,配以直径为250/spl mu/m的共晶SnPb钎料凸点,制备的镍基UBM的抗剪强度高达150 MPa,凸点电阻低至0.05/spl Omega/。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The impact of zincation on the electroless nickel UBM for low cost flip chip technology
Electroless nickel on aluminum bondpads followed by solder bumping is regarded as one of the promising solutions of low cost flip chip technology. Zincation is a key process step to form a strong, electrical conductive connection between nickel and aluminum. The morphology of the bondpad changes slightly after the degreasing and oxide removal procedures. Large zinc grains grow during zincation. To get more uniform and smooth zinc films, a second zincation is applied. The newly deposited zinc film leads to better adhesion of the flip chip interconnection. Therefore double zincation is employed instead of single zincation. The change of the surface roughness corresponds well with its morphology. The surface of the bondpad is examined by SEM and AFM. Another key factor of the zincation procedure is the immersion time in the bath. And in this paper the immersion time for the first and second zincations is 45 and 15s respectively. For a properly prepared nickel UBM on an 80/spl mu/m/spl times/80/spl mu/m Al bondpad followed by a eutectic SnPb solder bump (250/spl mu/m in diameter), its shear strength is as high as 150 MPa and the electrical resistance of a bump is as low as 0.05/spl Omega/.
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