冲击电离条件下AlGaAs/InGaAs HEMT的击穿电压

B. Lambert, N. Malbert, N. Labat, A. Touboul, P. Huguet
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引用次数: 2

摘要

所测试的P-HEMT技术广泛应用于Ku到ka波段的通信中,用于中功率放大。在这种运行状态下,存在冲击电离机制,但其对器件长期稳定性的影响尚不清楚。在这项工作中,我们研究了冲击电离和热应力对直流电特性的影响及其温度依赖性。所测试的动态电动汽车(DEC)基于具有δ掺杂层和单栅极凹槽的AlGaAs/InGaAs P-HEMT。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Breakdown voltage of AlGaAs/InGaAs HEMT submitted to life-tests in impact ionization regime
The P-HEMT technology under test is widely used in telecommunications from Ku to Ka-band for medium power amplification. In this operating regime, the impact ionization mechanism is present and its influence on the long-term stability of devices is not well known. In this work, we have studied the influence of the impact ionization and thermal stresses on DC electrical characteristics and their temperature dependence. The dynamic electrical vehicle (DEC) under test is based on an AlGaAs/InGaAs P-HEMT with a delta doped layer and a single gate recess.
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