衬底温度对有机蒸发法制备酞菁铜(CuPc)薄膜结构和光学性能的影响

S. Kamoldilok, B. Tunhoo, S. Sumriddetchkajorn, J. Nukeaw
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引用次数: 1

摘要

采用x射线衍射仪(XRD)、场发射扫描电镜(FE-SEM)和紫外可见分光光度计(UV-VIS)研究了衬底温度控制对有机蒸发法制备玻璃衬底上酞菁铜(CuPc)有机薄膜的影响。两种控制方法是开关温度控制和相位温度控制。衬底温度分别控制在27、80、100、120和150℃。所有薄膜的厚度均为30 nm。两种方法的XRD结果均显示[200]平面的取向峰为α相单斜结构。通过开关控制温度,XRD峰的强度随衬底温度的升高而增加。而相控温度下的XRD强度在27 ~ 100℃范围内增大,在120 ~ 150℃范围内减小。在150℃下生长的CuPc显示出通过开关温度控制获得的纳米棒状结构和通过相温度控制获得的纤维状结构。紫外-可见分光光度计测定两种方法的CuPc薄膜的光吸收在330 nm和620 nm处有两个强峰,分别为b波段和q波段。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Effect of Substrate Temperature on Structure and Optical Properties of Copper (II) Phthalocyanine (CuPc) Thin Films Prepared by Organic Evaporation
The influence of substrate temperature controls on copper (II) phthalocyanine (CuPc) organic thin films onto glass substrate by organic evaporation system has been examined by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM) and UV-VIS spectrophotometer. The two control methods are an on-off switching temperature control and a phase temperature control. The various substrate temperatures were controlled at 27, 80, 100, 120 and 150 degC, respectively. The thickness of all thin films is 30 nm. The XRD results from both methods show strongly peaks in orientation of [200] plane as alpha-phase monoclinic structure. By an on-off switching controlled temperature, the intensity of XRD peaks is increased with increasing substrate temperature. While intensity of XRD results from a phase controlled temperature shows increasing from 27 to 100 degC but decreasing from 120 to 150 degC. The CuPc grown at 150 degC exhibits nanorod-like structure obtained from an on-off switching temperature control and fiber-like structures obtained from a phase temperature controls. The optical absorptions of CuPc thin films of both methods determined from UV-VIS spectrophotometer show two strong peaks at 330 nm and 620 nm, denoted the B-band and Q-band, respectively.
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