横向荷载作用下封装金属互连的力学分析

B. Van Keymeulen, M. Gonzalez, F. Bossuyt, J. De Baets, J. Vanfleteren
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引用次数: 1

摘要

关于封装金属互连变形能力的新见解由于弯曲提出。封装金属互连在广泛的应用领域中用作电导体或测量系统,例如生物医学,可穿戴,纺织应用。然而,力学分析仍然局限于这些结构的可靠性研究,而变形性对于所谓的消失电子是主要目的的应用领域同样重要。基于将互连弯曲到一定曲率所需的工作量的分析将用于比较不同的互连配置。实验和仿真装置都是基于PDMS封装的pi增强铜磁道。结果和结论是特定于这种类型的互连,但可以推广到一个关于可拉伸互连的全局结论。从所获得的见解中可以证明,与直线互连线相比,周期性弯曲形状的互连线需要更少的工作,最多可减少10倍以上,以使互连弯曲到相同的曲率。此外,直互连线的可弯曲性由互连的形状决定,对于弯曲的轨道,封装将决定这一因素,封装厚度最大为1mm。结果表明,对于曲线形互连,封装厚度每增加250μm,工作量增加2倍。对于直互连线,封装厚度限制在20%/250μm以内。对于封装层bbb10 1mm,封装厚度将成为决定两种互连形状变形能力的主要因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanical analysis of encapsulated metal interconnects under transversal load
Novel insights regarding the ability of encapsulated metal interconnections to deform due to bending are presented. Encapsulated metal interconnections are used as electric conductor or measurement system within a wide range of applications fields, e.g. biomedical, wearable, textile applications. Nevertheless the mechanical analysis remains limited to reliability investigation of these configurations while deformability is as important for application fields where, so-called disappearing electronics is the main purpose. An analysis based on the work needed to bend interconnections to a certain curvature will be used to compare different interconnection configurations with each other. The experimental as well as the simulation setup is based on PDMS encapsulated PI-enhanced Cu tracks. The results and conclusions are specific for this type of interconnections, but can be extended to a global conclusion about stretchable interconnections. From the obtained insights it is proven that periodically meander-shaped interconnections need significant less work, up to more than 10 times less, to bend the interconnection to the same curvature compared to straight interconnection lines. Furthermore, the bendability of the straight interconnection lines is determined by the shape of the interconnection, where for meandered tracks the encapsulation will determine this factor, for an encapsulation thickness of maximum 1 mm. It shows out, for the meander-shaped interconnection, that per increase of 250μm encapsulation thickness the work raises with a factor 2. For straight interconnection lines the work in function of the encapsulation thickness is limited to 20%/250μm. For encapsulations > 1mm, the encapsulation thickness will become the predominant factor which determines the deformability for both interconnection shapes.
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