用于EUVL掩码检测的高亮度LDP源

R. Furuya, Kazuya Aoki, Y. Teramoto, T. Shirai, S. Morimoto, Hirdenori Watanabe, A. Nagano, D. Yajima, N. Ashizawa, Yoshihiko Sato
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引用次数: 0

摘要

激光辅助放电产生等离子体(LDP) EUV光源是一种用于光化掩模检测的光源,目前已在现场部署。随着EUVL工艺在量产过程中的应用越来越多,对掩模检测用EUV源的要求也越来越高。LDP光源能够以较大的极紫外光等离子体产生高亮度,从而满足这些要求。Ushio LDP信号源克服了LDP信号源所特有的各种问题,实现了高可靠性全天候运行,保持了高亮度。在本文中,我们讨论以下内容:(1)LDP源配置及其监控系统,(2)用于检查目的的LDP源的特征,(3)最近在该领域的可用性,(4)源稳定性和清洁度的改进,以及(5)源可用性的路线图。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-brightness LDP source for EUVL mask inspection
The Laser-assisted Discharge-produced Plasma (LDP) EUV source has been developed as a light source for actinic mask inspection and is currently deployed in the field. As the EUVL process is used more in the mass-production process, the requirement for EUV source for mask inspection is required more. LDP source enables the generation of high brightness with relatively large EUV plasma to fulfill these requirements. Ushio LDP source has overcome various issues specialized from LDP source and realized high reliability 24/7 based operation with high brightness maintained. In this paper, we address the followings: (1) LDP source configuration and its monitoring system, (2) Features of LDP source for inspection purposes, (3) Recent availability in the field, (4) Improvement of source stability and cleanliness, and (5) Roadmap of source availability.
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