{"title":"悬浮纳米材料的应变控制","authors":"S. Hermann, Simon Böttger, J. Albrecht","doi":"10.1109/IITC/MAM57687.2023.10154704","DOIUrl":null,"url":null,"abstract":"The use of nanomaterials in emerging electronics and sensor technologies is becoming more prevalent due to their unique properties. However, controlling the strain states of these materials in nanodevices remains a persistent challenge. Incorporating mechanical strain in a controllable manner is crucial and is simplified here for suspended nanomaterial assemblies in nano-electro-mechanical system (NEMS) configurations. We discuss a verified CMOS compatible and scalable surface micromachining approach with respect to design capabilities based on FE simulations. It is shown that in-plane stress applicable in multi-axial directions can be controlled by only a few geometry factors and by process parameters of strain mediating stress layers.","PeriodicalId":241835,"journal":{"name":"2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Controlling strain in suspended Nanomaterials\",\"authors\":\"S. Hermann, Simon Böttger, J. Albrecht\",\"doi\":\"10.1109/IITC/MAM57687.2023.10154704\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The use of nanomaterials in emerging electronics and sensor technologies is becoming more prevalent due to their unique properties. However, controlling the strain states of these materials in nanodevices remains a persistent challenge. Incorporating mechanical strain in a controllable manner is crucial and is simplified here for suspended nanomaterial assemblies in nano-electro-mechanical system (NEMS) configurations. We discuss a verified CMOS compatible and scalable surface micromachining approach with respect to design capabilities based on FE simulations. It is shown that in-plane stress applicable in multi-axial directions can be controlled by only a few geometry factors and by process parameters of strain mediating stress layers.\",\"PeriodicalId\":241835,\"journal\":{\"name\":\"2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC/MAM57687.2023.10154704\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC/MAM57687.2023.10154704","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The use of nanomaterials in emerging electronics and sensor technologies is becoming more prevalent due to their unique properties. However, controlling the strain states of these materials in nanodevices remains a persistent challenge. Incorporating mechanical strain in a controllable manner is crucial and is simplified here for suspended nanomaterial assemblies in nano-electro-mechanical system (NEMS) configurations. We discuss a verified CMOS compatible and scalable surface micromachining approach with respect to design capabilities based on FE simulations. It is shown that in-plane stress applicable in multi-axial directions can be controlled by only a few geometry factors and by process parameters of strain mediating stress layers.