{"title":"容积诊断在对照实验中的系统缺陷筛查","authors":"B. Seshadri, P. Gupta, Y. T. Lin, B. Cory","doi":"10.1109/TEST.2012.6401546","DOIUrl":null,"url":null,"abstract":"Controlled modification of different process parameters, using designed experiments, is a key method of achieving high yield in a volume manufacturing environment. However, these changes need to be validated extensively and screened for new systematic defects before release to production. This work presents a novel approach of using volume diagnosis to aid in the screening process. Silicon case studies are presented to validate the production worthiness of this approach.","PeriodicalId":353290,"journal":{"name":"2012 IEEE International Test Conference","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Systematic defect screening in controlled experiments using volume diagnosis\",\"authors\":\"B. Seshadri, P. Gupta, Y. T. Lin, B. Cory\",\"doi\":\"10.1109/TEST.2012.6401546\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Controlled modification of different process parameters, using designed experiments, is a key method of achieving high yield in a volume manufacturing environment. However, these changes need to be validated extensively and screened for new systematic defects before release to production. This work presents a novel approach of using volume diagnosis to aid in the screening process. Silicon case studies are presented to validate the production worthiness of this approach.\",\"PeriodicalId\":353290,\"journal\":{\"name\":\"2012 IEEE International Test Conference\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-11-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 IEEE International Test Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/TEST.2012.6401546\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE International Test Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TEST.2012.6401546","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Systematic defect screening in controlled experiments using volume diagnosis
Controlled modification of different process parameters, using designed experiments, is a key method of achieving high yield in a volume manufacturing environment. However, these changes need to be validated extensively and screened for new systematic defects before release to production. This work presents a novel approach of using volume diagnosis to aid in the screening process. Silicon case studies are presented to validate the production worthiness of this approach.