硅验证的自动DFM布局优化:校准寿命模型为基础的应用标准细胞

Kuang-Kuo Lin, B. Wong, F. Driessen, E. Morita, S. Klaver
{"title":"硅验证的自动DFM布局优化:校准寿命模型为基础的应用标准细胞","authors":"Kuang-Kuo Lin, B. Wong, F. Driessen, E. Morita, S. Klaver","doi":"10.1117/12.747021","DOIUrl":null,"url":null,"abstract":"DFM considerations have become an indispensable and integral part of advanced nanometer semiconductor product designs. Traditional first-generation DFM tools have focused on functional lithography hotspot detections. While useful, these tools offer designers few hints on the complex layout fixings and the intricate trade-off decisions required. With these limitations, DFM layout optimization has become a tedious and inconsistent design endeavor. In addition, the long and intense calibration cycle required for the traditional DFM models have hindered their effectiveness and timeliness. An automatic DFM layout optimization system that performs systematic multi-objective functional and parametric DFM optimizations at early design phase will be introduced. A calibration-lite methodology that has expedited the DFM model set-ups will be discussed along with the silicon validation test pattern designs. Finally, both simulation and silicon experiment results will be presented.","PeriodicalId":308777,"journal":{"name":"SPIE Photomask Technology","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Silicon-verified automatic DFM layout optimization: a calibration-lite model-based application to standard cells\",\"authors\":\"Kuang-Kuo Lin, B. Wong, F. Driessen, E. Morita, S. Klaver\",\"doi\":\"10.1117/12.747021\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"DFM considerations have become an indispensable and integral part of advanced nanometer semiconductor product designs. Traditional first-generation DFM tools have focused on functional lithography hotspot detections. While useful, these tools offer designers few hints on the complex layout fixings and the intricate trade-off decisions required. With these limitations, DFM layout optimization has become a tedious and inconsistent design endeavor. In addition, the long and intense calibration cycle required for the traditional DFM models have hindered their effectiveness and timeliness. An automatic DFM layout optimization system that performs systematic multi-objective functional and parametric DFM optimizations at early design phase will be introduced. A calibration-lite methodology that has expedited the DFM model set-ups will be discussed along with the silicon validation test pattern designs. Finally, both simulation and silicon experiment results will be presented.\",\"PeriodicalId\":308777,\"journal\":{\"name\":\"SPIE Photomask Technology\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-10-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SPIE Photomask Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.747021\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.747021","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

DFM已成为先进纳米半导体产品设计中不可或缺的重要组成部分。传统的第一代DFM工具侧重于功能光刻热点检测。虽然这些工具很有用,但对于复杂的布局固定和所需的复杂权衡决策,这些工具提供给设计师的提示很少。由于这些限制,DFM布局优化已成为一项繁琐且不一致的设计工作。此外,传统DFM模型校正周期长、强度大,影响了其有效性和及时性。介绍了一种在设计初期进行系统多目标功能优化和参数优化的DFM布局自动优化系统。加速DFM模型设置的校准寿命方法将与硅验证测试模式设计一起讨论。最后给出了仿真和硅实验结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Silicon-verified automatic DFM layout optimization: a calibration-lite model-based application to standard cells
DFM considerations have become an indispensable and integral part of advanced nanometer semiconductor product designs. Traditional first-generation DFM tools have focused on functional lithography hotspot detections. While useful, these tools offer designers few hints on the complex layout fixings and the intricate trade-off decisions required. With these limitations, DFM layout optimization has become a tedious and inconsistent design endeavor. In addition, the long and intense calibration cycle required for the traditional DFM models have hindered their effectiveness and timeliness. An automatic DFM layout optimization system that performs systematic multi-objective functional and parametric DFM optimizations at early design phase will be introduced. A calibration-lite methodology that has expedited the DFM model set-ups will be discussed along with the silicon validation test pattern designs. Finally, both simulation and silicon experiment results will be presented.
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