气相色谱-质谱(GC-MS)在后端半导体中的应用:化学清洗效率评估

L. Ying, Lim Koo Foong
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引用次数: 0

摘要

与GC-MS在半导体前端(晶圆制造)的应用相比,该技术在半导体后端(封装组装工艺评估)的应用似乎较少。在这项工作中,GC-MS应用于一种不同的分析方法,用于在后端过程中的清洁效率评估。这种分析方法被提出、执行、评估、改进,并最终在使用后端工艺的包装的清洁质量表征方法中报告了积极的结果。在本评估中介绍了一种独特的样品制备方法,以收集从整个外部包装表面溶解的溶液,并使GC-MS分析成为可能。在气相色谱-质谱分析方法中加入参比物作为标准品对于确保清洁效率评估的结论至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Gas Chromatography Mass Spectrometry (GC-MS) application in back end semiconductor: Chemical cleaning efficiency assessment
In comparison to GC-MS applications in semiconductor front end (wafer fabrication), this technique seems to have fewer applications in semiconductor back end (package assembly processes assessment. In this work, GC-MS is applied in a different analysis approach for cleaning efficiency assessment in one of the back end processes. This analysis approach is proposed, executed, assessed, improved and finally reported with positive results in the characterization method of cleaning quality using packages from back end processes. A unique sample preparation method is introduced in this assessment to collect solution which is dissolved from the entire external package surfaces and enables GC-MS analysis. Inclusion of reference as standard in this GC-MS analysis approach is crucial to ensure conclusive results of cleaning efficiency assessment.
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