新一代功率单极器件:浮岛MOS晶体管(FLIMOST)的概念

N. Cezac, F. Morancho, P. Rossel, H. Tranduc, A. Payre-Lavigne
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引用次数: 48

摘要

本文提出了一种新型的垂直DMOS晶体管,在其漂移区放置浮岛。这种新结构被称为“FLIMOST”,与传统的VDMOST相比,表现出更好的状态性能。例如,当击穿电压为900伏时,性能在特定导通电阻方面得到了显著改善(相对于传统结构降低约70%,相对于硅极限降低40%)。此外,确定了FLIMOSFET家族的具体导通电阻理论极限,并与“Superjunction”MOS晶体管家族的导通电阻进行了比较:这种比较显示了FLIMOSFET在200 V-1000 V击穿电压范围内的强烈兴趣。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A new generation of power unipolar devices: the concept of the FLoating islands MOS transistor (FLIMOST)
In this paper, a new vertical DMOS Transistor is proposed, in which floating islands are placed in the drift region. This new structure, called "FLIMOST", exhibits improved on-state performance when compared to the conventional VDMOST. For instance, for a breakdown voltage of 900 Volts, the performance is strongly improved in term of specific on-resistance (reduction of about 70% relative to the conventional structure and 40% relative to the silicon limit). Moreover the specific on-resistance theoretical limits of FLIMOST family are determined and compared to those of the "Superjunction" MOS Transistor family: this comparison shows the strong interest of the FLIMOSFET in the 200 V-1000 V breakdown voltage range.
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