A. Ahmadi, K. Huang, A. Nahar, Bob Orr, M. Pas, J. Carulli, Y. Makris
{"title":"晶圆厂到晶圆厂产品迁移的良率预测","authors":"A. Ahmadi, K. Huang, A. Nahar, Bob Orr, M. Pas, J. Carulli, Y. Makris","doi":"10.1109/VTS.2015.7116261","DOIUrl":null,"url":null,"abstract":"We investigate the utility of correlations between e-test and probe test measurements in predicting yield. Specifically, we first examine whether statistical methods can accurately predict parametric probe test yield as a function of e-test measurements within the same fab. Then, we investigate whether the e-test profile of a destination fab, in conjunction with the e-test and probe test profiles of a source fab, suffice for accurate yield prognosis during fab-to-fab product migration. Results using an industrial dataset of ~3.5M devices from a 65nm Texas Instruments RF transceiver design fabricated in two different fabs reveal that (i) within-fab yield prediction error is in the range of a few tenths of a percentile point, and (ii) fab-to-fab yield prediction error is in the range of half a percentile point.","PeriodicalId":187545,"journal":{"name":"2015 IEEE 33rd VLSI Test Symposium (VTS)","volume":"409 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Yield prognosis for fab-to-fab product migration\",\"authors\":\"A. Ahmadi, K. Huang, A. Nahar, Bob Orr, M. Pas, J. Carulli, Y. Makris\",\"doi\":\"10.1109/VTS.2015.7116261\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We investigate the utility of correlations between e-test and probe test measurements in predicting yield. Specifically, we first examine whether statistical methods can accurately predict parametric probe test yield as a function of e-test measurements within the same fab. Then, we investigate whether the e-test profile of a destination fab, in conjunction with the e-test and probe test profiles of a source fab, suffice for accurate yield prognosis during fab-to-fab product migration. Results using an industrial dataset of ~3.5M devices from a 65nm Texas Instruments RF transceiver design fabricated in two different fabs reveal that (i) within-fab yield prediction error is in the range of a few tenths of a percentile point, and (ii) fab-to-fab yield prediction error is in the range of half a percentile point.\",\"PeriodicalId\":187545,\"journal\":{\"name\":\"2015 IEEE 33rd VLSI Test Symposium (VTS)\",\"volume\":\"409 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-04-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE 33rd VLSI Test Symposium (VTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VTS.2015.7116261\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE 33rd VLSI Test Symposium (VTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VTS.2015.7116261","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
We investigate the utility of correlations between e-test and probe test measurements in predicting yield. Specifically, we first examine whether statistical methods can accurately predict parametric probe test yield as a function of e-test measurements within the same fab. Then, we investigate whether the e-test profile of a destination fab, in conjunction with the e-test and probe test profiles of a source fab, suffice for accurate yield prognosis during fab-to-fab product migration. Results using an industrial dataset of ~3.5M devices from a 65nm Texas Instruments RF transceiver design fabricated in two different fabs reveal that (i) within-fab yield prediction error is in the range of a few tenths of a percentile point, and (ii) fab-to-fab yield prediction error is in the range of half a percentile point.