用传统CMOS工艺制备盖革模式雪崩光电二极管

A. Rochas, P. Besse, R. Popovic
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引用次数: 9

摘要

采用传统CMOS工艺制备了具有优异性能的盖革模式雪崩光电二极管。用于蓝色检测的80μm2有源面积光电二极管包含有效的保护环结构,以防止边缘击穿。采用P+/ Nwell/P衬底双结结构获得了对蓝色的选择性。靠近表面的第一个结偏置高于击穿电压,第二个结短路。采用被动淬火方法进行表征。在室温下,过量偏置电压为-2.85V时,暗计数率仅为220 c.p.s.。在λ=460nm处,该偏置电压的最大盖革模量子效率约为20%。CMOS工艺的制造为被动淬火或主动淬火的协整开辟了道路,这取决于应用和读出电子器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Geiger Mode Avalanche Photodiode Fabricated in a Conventional CMOS Technology
A Geiger mode avalanche photodiode with outstanding characteristics is fully fabricated in a conventional CMOS process. The 80μm2 active area photodiode for blue detection contains an efficient guard-ring structure to prevent edge breakdown. The selectivity for blue is obtained using a P+/ Nwell/Psubstrate dual junction structure. The first junction close to the surface is biased above the breakdown voltage, the second junction is short-circuited. A characterization using a passive quenching method is done. A value of the dark count rate of only 220 c.p.s. is obtained for an excess bias voltage of -2.85V, at room temperature. The maximum Geiger mode quantum efficiency for this excess bias voltage is about 20% at λ=460nm. The fabrication in a CMOS process opens the way to the co-integration of passive quenching or active quenching depending on applications and read-out electronics.
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