构建低温IV族外延的超高真空等离子体增强化学气相沉积系统的安全考虑

H. Naseem, Shui-Qing Yu, S. El-Ghazaly, Z. Waqar, H. Abu-Safe, S. Adcock, B. Conley, A. Mosleh, Bryant Hankton, Asanka Munasinghe
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引用次数: 0

摘要

工程研究中心电气工程系光伏实验室设计并制造了一种最先进的化学气相沉积工具,用于沉积IV族元素及其合金的外延薄膜。由于使用剧毒和易燃/焦性气体,安全性和过程完整性从一开始就融入了设计中。学院和大学安全委员会以及外部顾问在整个规划和建设阶段都被使用。制定了各种程序的标准操作程序和指南,并编制了安全培训文件,以便对新学生和研究人员进行适当培训。该实验室有望成为该大学新设备建造和采购的典范。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Safety Considerations in Building Ultra-High Vacuum Plasma Enhanced Chemical Vapor Deposition System for Low Temperature Group IV Epitaxy
A state-of-the-art chemical vapor deposition tool has been designed and built at the Photovoltaics Lab, Department of Electrical Engineering in the Engineering Research Center for depositing epitaxial films of group IV elements and their alloys. Due to the use of extremely toxic and flammable/pyrophoric gases safety and process integrity was built into the design right from the get go. College and University safety committees as well as external advisors were used throughout planning and building stages. Standard operating procedures (SOP) and travelers have been developed for various procedures and safety-training documents have been produced for proper training of new students and researchers. This lab is expected to be a model for new equipment building and acquisition at the University.
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