用并行PDE求解器L/sub /SS模拟热氧化和扩散过程

1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095) Pub Date : 1996-09-02 DOI:10.1109/SISPAD.1996.865286

W. Joppich, S. Mijalkovic

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引用次数: 0

摘要

本文提出了一种严格的模拟热氧化和扩散现象的方法。由于未来数值问题将会增加，特别是在面向三维过程模拟时，因此特别强调并行方法，该方法另外使用最优阶解方法。基于椭圆型和抛物型偏微分方程的并行求解环境L/sub i/SS，开发了该工具。

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Simulation of thermal oxidation and diffusion processes by parallel PDE solver L/sub i/SS

In this paper a rigorous approach to simulate thermal oxidation and diffusion phenomena is presented. Because the numerical problems will increase in future, especially when looking towards three-dimensional process simulation, special emphasis is laid upon a parallel approach which additionally uses an optimal order solution method. Based on an environment for the parallel solution of elliptic and parabolic PDEs, L/sub i/SS, such a tool was developed.

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1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)

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