通过分布模型进行产量估计

T. Uezono, K. Okada, K. Masu
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引用次数: 6

摘要

在本文中,我们提出了一个通过分布模型来估计产量。所提出的模型表达了过孔数与导线长度之间的关系。我们还可以估计电路中的通孔总数,这是由通孔分布和导线长度分布得出的。通道分布是轨道利用率的函数,线长分布可以从门级网表和布局区域导出。我们从为0.18和0.13 μ m CMOS工艺设计的商用芯片中提取模型参数,并证明了过孔导致的良率下降
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Via distribution model for yield estimation
In this paper, we propose a via distribution model for yield estimation. The proposed model expresses a relationship between the number of vias and wire length. We can also estimate the total number of vias in a circuit, which is derived from the via distribution and the wire-length distribution. The via distribution is modeled as a function of track utilization, and the wire-length distribution can be derived from a gate-level netlist and layout area. We extract model parameters from the commercial chips designed for 0.18-mum and 0.13-mum CMOS processes, and demonstrate yield degradation caused by vias
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