集成薄膜电阻匹配测试结构的设计与评价

Proceedings of the 2015 International Conference on Microelectronic Test Structures Pub Date : 2015-03-23 DOI:10.1109/ICMTS.2015.7106127

H. Tuinhout, N. Wils, P. Huiskamp, Eelco de Koning

{"title":"集成薄膜电阻匹配测试结构的设计与评价","authors":"H. Tuinhout, N. Wils, P. Huiskamp, Eelco de Koning","doi":"10.1109/ICMTS.2015.7106127","DOIUrl":null,"url":null,"abstract":"A test structure is presented that combines two types of full Kelvin matched resistor pairs in a single 12 pad process control compatible test line. Based on these structures, matching results of SiCr resistors in a BiCMOS RF technology are discussed, demonstrating some of the frequently encountered challenges of interpreting subtle parametric mismatch fluctuation effects.","PeriodicalId":177627,"journal":{"name":"Proceedings of the 2015 International Conference on Microelectronic Test Structures","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-03-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Design and evaluation of an integrated thin film resistor matching test structure\",\"authors\":\"H. Tuinhout, N. Wils, P. Huiskamp, Eelco de Koning\",\"doi\":\"10.1109/ICMTS.2015.7106127\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A test structure is presented that combines two types of full Kelvin matched resistor pairs in a single 12 pad process control compatible test line. Based on these structures, matching results of SiCr resistors in a BiCMOS RF technology are discussed, demonstrating some of the frequently encountered challenges of interpreting subtle parametric mismatch fluctuation effects.\",\"PeriodicalId\":177627,\"journal\":{\"name\":\"Proceedings of the 2015 International Conference on Microelectronic Test Structures\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-03-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 2015 International Conference on Microelectronic Test Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2015.7106127\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2015 International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2015.7106127","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 2

摘要

提出了一种将两种类型的全开尔文匹配电阻对组合在单个12焊盘过程控制兼容测试线上的测试结构。基于这些结构，讨论了BiCMOS射频技术中SiCr电阻的匹配结果，展示了解释微妙参数失配波动效应时经常遇到的一些挑战。

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Design and evaluation of an integrated thin film resistor matching test structure

A test structure is presented that combines two types of full Kelvin matched resistor pairs in a single 12 pad process control compatible test line. Based on these structures, matching results of SiCr resistors in a BiCMOS RF technology are discussed, demonstrating some of the frequently encountered challenges of interpreting subtle parametric mismatch fluctuation effects.

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Proceedings of the 2015 International Conference on Microelectronic Test Structures

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