J. Kim, D. Lee, Y. S. Kim, J. Son, W. Luo, D. Marcon, S. Decoutere
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引用次数: 2
摘要
首次在200 mm cmos兼容工艺中展示了650 V无色散增强模式GaN-on-Si p-GaN hemt。36mm宽功率器件的阈值电压为2.1 V,输出电流为8a,导通电阻为13 Ω-mm。讨论了该技术从研发阶段成熟到生产环境所面临的制造挑战。
650 V Dispersion-free enhancement-mode GaN-on-Si HEMTs processed in a 200 mm CMOS Fab
650 V dispersion-free enhancement-mode GaN-on-Si p-GaN HEMTs are demonstrated in a 200 mm CMOS-compatible process, for the first time. The threshold voltage of 36 mm-width power devices is 2.1 V, the output current is 8 A, and the on-resistance is 13 Ω-mm. The manufacturing challenges when maturing the technology from the research and development phase to a production environment are discussed.