650 V无色散增强模式GaN-on-Si HEMTs在200 mm CMOS Fab中加工

J. Kim, D. Lee, Y. S. Kim, J. Son, W. Luo, D. Marcon, S. Decoutere
{"title":"650 V无色散增强模式GaN-on-Si HEMTs在200 mm CMOS Fab中加工","authors":"J. Kim, D. Lee, Y. S. Kim, J. Son, W. Luo, D. Marcon, S. Decoutere","doi":"10.1109/IFWS.2017.8246002","DOIUrl":null,"url":null,"abstract":"650 V dispersion-free enhancement-mode GaN-on-Si p-GaN HEMTs are demonstrated in a 200 mm CMOS-compatible process, for the first time. The threshold voltage of 36 mm-width power devices is 2.1 V, the output current is 8 A, and the on-resistance is 13 Ω-mm. The manufacturing challenges when maturing the technology from the research and development phase to a production environment are discussed.","PeriodicalId":131675,"journal":{"name":"2017 14th China International Forum on Solid State Lighting: International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"650 V Dispersion-free enhancement-mode GaN-on-Si HEMTs processed in a 200 mm CMOS Fab\",\"authors\":\"J. Kim, D. Lee, Y. S. Kim, J. Son, W. Luo, D. Marcon, S. Decoutere\",\"doi\":\"10.1109/IFWS.2017.8246002\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"650 V dispersion-free enhancement-mode GaN-on-Si p-GaN HEMTs are demonstrated in a 200 mm CMOS-compatible process, for the first time. The threshold voltage of 36 mm-width power devices is 2.1 V, the output current is 8 A, and the on-resistance is 13 Ω-mm. The manufacturing challenges when maturing the technology from the research and development phase to a production environment are discussed.\",\"PeriodicalId\":131675,\"journal\":{\"name\":\"2017 14th China International Forum on Solid State Lighting: International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 14th China International Forum on Solid State Lighting: International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IFWS.2017.8246002\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 14th China International Forum on Solid State Lighting: International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IFWS.2017.8246002","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

首次在200 mm cmos兼容工艺中展示了650 V无色散增强模式GaN-on-Si p-GaN hemt。36mm宽功率器件的阈值电压为2.1 V,输出电流为8a,导通电阻为13 Ω-mm。讨论了该技术从研发阶段成熟到生产环境所面临的制造挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
650 V Dispersion-free enhancement-mode GaN-on-Si HEMTs processed in a 200 mm CMOS Fab
650 V dispersion-free enhancement-mode GaN-on-Si p-GaN HEMTs are demonstrated in a 200 mm CMOS-compatible process, for the first time. The threshold voltage of 36 mm-width power devices is 2.1 V, the output current is 8 A, and the on-resistance is 13 Ω-mm. The manufacturing challenges when maturing the technology from the research and development phase to a production environment are discussed.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信