使用电镀共晶金锡焊料的硅与氧化铝衬底的无焊剂结合

J.S. Kim, W. Choi, A. Shkel, C.C. Lee
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引用次数: 1

摘要

采用电镀的Au80Sn20共晶合金,成功地将6mm × 9mm的大硅片粘接在氧化铝基体上。共晶AuSn是最著名的硬质焊料之一,具有优异的抗疲劳性能和机械性能。介绍了一种在50 μ m真空环境下的无焊剂粘接工艺。在真空环境中防止锡氧化。与在空气中结合相比,氧含量预计将减少15200倍。硅-氧化铝键合的挑战之一是硅的热膨胀率为2.7倍10-6 ppm/摄氏度,而氧化铝的热膨胀率为7倍10-6 ppm/摄氏度。采用电镀法制备多层焊料。它是真空沉积法的一种经济的替代方法,可以生产厚的焊料。采用扫描电子显微镜(SEM)和能量色散x射线能谱(EDX)对制造的接头进行了检测。结果表明,要使叠合层形成均匀的AuSn共晶合金,需要适当的结合条件。在扫描声显微镜(SAM)下,获得了几乎无空洞的接头。为了评估焊点和结合结构的可靠性,样品通过热循环测试来确定失效模式。研究了热循环试验过程中焊点的显微组织变化
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fluxless bondings of silicon to alumina substrate using electroplated eutectic Au-Sn solder
Large 6 mm times 9 mm silicon dice have been successfully bonded on alumina substrate with electroplated Au80Sn20 eutectic alloy. Eutectic AuSn is one of the best known hard solders having excellent fatigue-resistance and mechanical properties. A fluxless bonding process in 50 militorrs of vacuum environment is presented. Vacuum environment is employed to prevent tin oxidation during the process. The oxygen content is expected to be reduced by a factor of 15,200, comparing to bonding in air. One of the challenges in silicon-to-alumina bonding is the large mismatch in thermal expansion between silicon of 2.7 times 10-6 ppm/degC and alumina of 7 times 10 -6 ppm/degC. Electroplating method is used to build multi-layer solder. It is an economical alternative to vacuum deposition method and can produce thick solders. Joints fabricated are examined using scanning electron microscope (SEM), and energy dispersive X-ray spectroscopy (EDX). It is found that proper bonding condition is needed to turn the stacked layers into a uniform AuSn eutectic alloy. Nearly void-free joints are achieved and confirmed by a scanning acoustic microscope (SAM). To evaluate the reliability of the solder joint and the bonded structure, samples go through thermal cycling test to determine failure modes. Microstructure changes of the solder joints during thermal cycling test are also investigated
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