超声处理是半导体材料和器件缺陷工程的新途径

1998 International Semiconductor Conference. CAS'98 Proceedings (Cat. No.98TH8351) Pub Date : 1998-10-06 DOI:10.1109/SMICND.1998.732332

M. K. Sheinkman, N. Korsunskaya, S. Ostapenko

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引用次数: 2

摘要

半导体的超声处理(UST)在许多情况下导致材料性能和器件参数的稳定改善，因此可以用于缺陷工程。描述了这种效果的物理背景以及UST方法和设备。

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Ultrasound treatment as a new way for defect engineering in semiconductor materials and devices

UltraSound Treatment, UST, of semiconductors in many cases results in a stable improvement of material properties and device parameters and thus can be used in a defect engineering. The physical backgrounds of such effects as well as UST methods and apparatus are described.

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来源期刊

1998 International Semiconductor Conference. CAS'98 Proceedings (Cat. No.98TH8351)

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