{"title":"高频溶液在TiSi2表面清洗中的应用","authors":"M. Baklanov, S. Vanhaelemeersch, K. Maex","doi":"10.1109/MAM.1998.887531","DOIUrl":null,"url":null,"abstract":"HF-based solutions are widely used in microelectronics for surface cleaning. For example these solutions are very effective for the removal of SiO/sub 2/ formed during storage in air and for the passivation of a silicon surface. These solutions are also used for the final cleaning of TiSi/sub 2/ after the formation of contact holes in SiO/sub 2/. Nevertheless, the influence of HF solutions on the TiSi/sub 2/ properties and contact resistance with metal has not been studied. This work is devoted to the study of the influence of HF solutions on TiSi/sub 2/ properties.","PeriodicalId":302609,"journal":{"name":"European Workshop Materials for Advanced Metallization,","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-03-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Application of HF solutions for the cleaning of TiSi2 surface\",\"authors\":\"M. Baklanov, S. Vanhaelemeersch, K. Maex\",\"doi\":\"10.1109/MAM.1998.887531\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"HF-based solutions are widely used in microelectronics for surface cleaning. For example these solutions are very effective for the removal of SiO/sub 2/ formed during storage in air and for the passivation of a silicon surface. These solutions are also used for the final cleaning of TiSi/sub 2/ after the formation of contact holes in SiO/sub 2/. Nevertheless, the influence of HF solutions on the TiSi/sub 2/ properties and contact resistance with metal has not been studied. This work is devoted to the study of the influence of HF solutions on TiSi/sub 2/ properties.\",\"PeriodicalId\":302609,\"journal\":{\"name\":\"European Workshop Materials for Advanced Metallization,\",\"volume\":\"54 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-03-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Workshop Materials for Advanced Metallization,\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MAM.1998.887531\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Workshop Materials for Advanced Metallization,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MAM.1998.887531","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Application of HF solutions for the cleaning of TiSi2 surface
HF-based solutions are widely used in microelectronics for surface cleaning. For example these solutions are very effective for the removal of SiO/sub 2/ formed during storage in air and for the passivation of a silicon surface. These solutions are also used for the final cleaning of TiSi/sub 2/ after the formation of contact holes in SiO/sub 2/. Nevertheless, the influence of HF solutions on the TiSi/sub 2/ properties and contact resistance with metal has not been studied. This work is devoted to the study of the influence of HF solutions on TiSi/sub 2/ properties.
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