用于x射线相衬成像的高纵横比、大面积硅基光栅

J. Baborowski, V. Revol, C. Kottler, R. Kaufmann, P. Niedermann, F. Cardot, A. Dommann, A. Neels, M. Despont
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引用次数: 4

摘要

本文报道了用于x射线相衬成像(XPCI)的高纵横比硅基光栅制造的最新进展。基于光栅的XPCI在一次测量中提供了关于硬x射线频率下样品的吸收系数、折射率和微观结构的独特信息。由于这个原因,XPCI可以潜在地克服传统的基于吸收的放射照相的局限性,特别是对于弱吸收材料。开发了一种新的微加工工艺,可以制造出全套大面积、高纵横比、缺陷少的x射线光栅。实验证明了XPCI与传统的基于吸收的x线摄影的互补性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High aspect ratio, Large area silicon-based gratings for X-ray phase contrast imaging
This paper reports on the latest developments in the manufacturing of high aspect ratio silicon-based gratings used for X-ray phase contrast imaging (XPCI). Grating-based XPCI provides, in one measurement, unique information about the absorption coefficient, the index of refraction and the microscopic structure of a sample at hard X-ray frequencies. For this reason, XPCI can potentially overcome the limitations of classical absorption-based radiography, notably for weakly absorbing materials. New micro-fabrication processes were developed to manufacture full set of large area and high aspect ratio X-ray gratings with few defects. The complementarity of XPCI with conventional absorption-based radiography was experimentally demonstrated.
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