一种温度低于共晶点的共晶键合技术

C.Y. Wang, C.C. Lee
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引用次数: 16

摘要

作者报告了一种只需240摄氏度就能产生近共晶金-锡键合的技术。粘接后,该器件可承受250℃的后处理温度而不发生粘接降解。键合介质由直接沉积在待键合对象上的Au-Sn多层复合材料组成。该技术还消除了预成形件,减少了锡氧化,并提供了良好的键合层厚度控制。用扫描声显微镜对2 mm*3 mm的GaAs片进行了键合,结果表明得到了高质量的键合。试件在-196℃~ 160℃范围内进行了40次循环热冲击试验,无粘结退化和模具开裂。扫描电子显微镜和能量色散x射线研究揭示了键合过程的有趣特征。熔点测试证实,粘合层的熔化温度确实为280℃,高于240℃的工艺温度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An eutectic bonding technology at a temperature below the eutectic point
The authors report a technique which needs only 240 degrees C to produce nearly eutectic Au-Sn bonding. After bonding, the device can take a postprocessing temperature of 250 degrees C without bonding degradation. The bonding medium consists of Au-Sn multilayer composite deposited directly on the object to be bonded. This technology also eliminates the preforms, reduces tin oxidation, and provides good control of bonding layer thickness. Results of bonding 2 mm*3 mm GaAs dice show that high-quality bondings are obtained, as evaluated by a scanning acoustic microscope. The specimens underwent 40 cycles of thermal shock test between -196 degrees C and 160 degrees C without bonding degradation and die cracking. Scanning electron microscopy and energy-dispersive X-ray studies reveal interesting characteristics of the bonding process. Melting point tests confirm that the bonding layer indeed has a melting temperature of 280 degrees C, higher than the 240 degrees C process temperature.<>
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