陡坡2D应变场效应晶体管:2D- fet

Daniel S. Schulman, Andrew J Arnold, Saptarshi Das
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引用次数: 3

摘要

许多进步已经允许CMOS持续积极的尺寸缩放到最先进的10nm节点的当前状态,但没有一个是解决基本的玻尔兹曼统计限制,这阻碍了登纳德电压缩放。半导体行业在颠覆性的“陡坡”晶体管技术上投入了大量资金,这些技术有望降低工作电压,大幅降低功耗。虽然这些技术中有许多显示出巨大的前景,如隧道场效应管、相变场效应管,甚至纳米机械开关,但由于导通电流差、开关范围有限和可靠性等问题,它们距离商业化和大规模集成还很远[4,5]。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Steep slope 2D strain field effect transistor: 2D-SFET
Numerous advancements have allowed continuous aggressive dimensional scaling of CMOS to the current state of the art 10nm node but none are solutions to the fundamental Boltzmann statistics limits which have stalled Dennard voltage scaling. The semiconductor industry has invested heavily in disruptive, "steep slope" transistor technologies which promise lower operating voltages and dramatically reduced power consumption. While many of these technologies show great promise such as Tunnel FETs, Phase Change FETs, and even nanomechanical switches, all are far from commercialization and large-scale integration due to issues ranging from poor ON currents, limited switching ranges and reliability[4, 5].
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