优化了直流磁控溅射法制备氧化铟薄膜

A. Axelevitch, E. Rabinovitch, G. Golan
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引用次数: 0

摘要

近年来,具有高导电性和最大光学透明度的透明导电涂料备受关注。迄今为止,在这一领域发表的大部分作品都集中在薄膜涂层的物理分析和设计上。在我们的工作中,我们提出了一种不同的透明导电薄膜的制造设计方法。采用线性数学模型来控制这些薄膜的加工阶段,而不是分析最终产品的复杂物理模型。线性模型是基于数学方法来优化工艺参数以获得最佳涂层性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimized indium oxide films prepared by DC magnetron sputtering
Transparent conductive coatings with high electrical conductivity and maximum optical transparency attracts much attention in recent years. Most of the works published till present in this field were concentrated in the physical analysis and design of thin film coatings. In our work we present a different approach to the fabrication design of transparent conductive thin films. Instead of analyzing complex physical models of the final product, a linear mathematical model to control the processing stages of these films is applied. The linear model is based on a mathematical approach which optimizes the processing parameters to yield best coating performance.
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