低于0.25 /spl μ m CMOS的SOI技术前景、挑战与机遇

Proceedings of 1993 IEEE International SOI Conference Pub Date : 1900-01-01 DOI:10.1109/SOI.1993.344614

B. Davari, H. Hovel, G. Shahidi

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引用次数: 11

摘要

本文对SOI技术在低于0.25 /spl μ m CMOS领域的应用前景进行了展望。提出了SOI技术成为主流半导体技术所面临的主要挑战和机遇。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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SOI technology outlook for sub-0.25 /spl mu/m CMOS, challenges and opportunities

In this paper, the outlook for the SOI technology in the sub-0.25 /spl mu/m CMOS regime is discussed. The key challenges and opportunities for the SOI technology to become a main stream semiconductor technology are presented.<>

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Proceedings of 1993 IEEE International SOI Conference

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