EUV还是193i: 2018年谁将赢得7nm节点HVM的舞台中心?

{"title":"EUV还是193i: 2018年谁将赢得7nm节点HVM的舞台中心?","authors":"Yoshinori Nagaoka, J. Miyazaki","doi":"10.1117/12.2208944","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":308777,"journal":{"name":"SPIE Photomask Technology","volume":"138 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?\",\"authors\":\"Yoshinori Nagaoka, J. Miyazaki\",\"doi\":\"10.1117/12.2208944\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":308777,\"journal\":{\"name\":\"SPIE Photomask Technology\",\"volume\":\"138 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-10-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SPIE Photomask Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2208944\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2208944","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}