用于集成电路调试和故障分析的动态光学技术

2006 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits Pub Date : 2006-07-03 DOI:10.1109/IPFA.2006.250980

J. Ferrigno, R. Desplats, P. Perdu, K. Sanchez, F. Beaudoin, D. Lewis

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引用次数: 3

摘要

光学技术(光发射和激光刺激技术)通常用于精确的集成电路缺陷定位。在分析的早期阶段，选择正确的技术是一项越来越复杂的任务。在某些情况下，一种技术可能带来价值，而其他技术则没有。使用180nm测试结构装置，我们展示了发射显微镜(EMMI)，时间分辨发射(TRE)和动态激光刺激(DLS)的互补结果，以帮助故障分析人员或调试工程师选择正确的方法

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Dynamic Optical Techniques for IC Debug and Failure Analysis

Optical techniques (light emission and laser stimulation techniques) are routinely used for precise IC defect localization. At the early stage of an analysis, choosing the right technique is an increasingly complex task. In some cases, one technique may bring value but no the others. Using an 180nm test structure device we present results showing the complementary of emission microscopy (EMMI), time-resolved emission (TRE) and dynamic laser stimulation (DLS) in order to help failure analyists or debug engineers to choose the right approach

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2006 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits

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