{"title":"结合压电响应力显微镜分析研究掺杂和未掺杂铁电HfO2的唤醒和疲劳特性","authors":"S. Shibayama, L. Xu, S. Migita, A. Toriumi","doi":"10.1109/VLSIT.2016.7573415","DOIUrl":null,"url":null,"abstract":"This paper reports wake-up and fatigue effects in ferroelectric HfO2 with and without Y-doping by comparing macroscopic capacitor characteristics with nano-level piezo-response force microscopy (PFM) analysis. Even though initial characteristics are almost the same between with and without Y-doping, endurance characteristics are really different macroscopically, and PFM study microscopically supports the endurance characteristics as well. This fact suggests that the robustness of HfO2 ferroelectricity should be sensitive to the doping.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Study of wake-up and fatigue properties in doped and undoped ferroelectric HfO2 in conjunction with piezo-response force microscopy analysis\",\"authors\":\"S. Shibayama, L. Xu, S. Migita, A. Toriumi\",\"doi\":\"10.1109/VLSIT.2016.7573415\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper reports wake-up and fatigue effects in ferroelectric HfO2 with and without Y-doping by comparing macroscopic capacitor characteristics with nano-level piezo-response force microscopy (PFM) analysis. Even though initial characteristics are almost the same between with and without Y-doping, endurance characteristics are really different macroscopically, and PFM study microscopically supports the endurance characteristics as well. This fact suggests that the robustness of HfO2 ferroelectricity should be sensitive to the doping.\",\"PeriodicalId\":129300,\"journal\":{\"name\":\"2016 IEEE Symposium on VLSI Technology\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-06-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE Symposium on VLSI Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.2016.7573415\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2016.7573415","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Study of wake-up and fatigue properties in doped and undoped ferroelectric HfO2 in conjunction with piezo-response force microscopy analysis
This paper reports wake-up and fatigue effects in ferroelectric HfO2 with and without Y-doping by comparing macroscopic capacitor characteristics with nano-level piezo-response force microscopy (PFM) analysis. Even though initial characteristics are almost the same between with and without Y-doping, endurance characteristics are really different macroscopically, and PFM study microscopically supports the endurance characteristics as well. This fact suggests that the robustness of HfO2 ferroelectricity should be sensitive to the doping.