{"title":"基于缓冲区插入技术的IP保护水印系统","authors":"Guangyu Sun, Zhiqiang Gao, Yi Xu","doi":"10.1109/ISQED.2006.19","DOIUrl":null,"url":null,"abstract":"In this paper, we introduce a kind of watermarking system for IP protection (IPP). The copyright is encrypted and then embedded into the design as the watermark in buffer insertion stage. This watermarking technique can identify the design copyright uniquely, and is fit for both ASIC using standard cells and full-custom design. We have evaluated the technique on several testing designs, the inserted results show that the watermarking process achieves 100% success causing little overhead on design performance. Extraction and identification process of the watermark is also analyzed. The watermark embedded is hard to be found out and tampered away, and the technique can be integrated into EDA tools for manufacturing","PeriodicalId":138839,"journal":{"name":"7th International Symposium on Quality Electronic Design (ISQED'06)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"A watermarking system for IP protection by buffer insertion technique\",\"authors\":\"Guangyu Sun, Zhiqiang Gao, Yi Xu\",\"doi\":\"10.1109/ISQED.2006.19\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we introduce a kind of watermarking system for IP protection (IPP). The copyright is encrypted and then embedded into the design as the watermark in buffer insertion stage. This watermarking technique can identify the design copyright uniquely, and is fit for both ASIC using standard cells and full-custom design. We have evaluated the technique on several testing designs, the inserted results show that the watermarking process achieves 100% success causing little overhead on design performance. Extraction and identification process of the watermark is also analyzed. The watermark embedded is hard to be found out and tampered away, and the technique can be integrated into EDA tools for manufacturing\",\"PeriodicalId\":138839,\"journal\":{\"name\":\"7th International Symposium on Quality Electronic Design (ISQED'06)\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-03-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"7th International Symposium on Quality Electronic Design (ISQED'06)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISQED.2006.19\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"7th International Symposium on Quality Electronic Design (ISQED'06)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2006.19","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A watermarking system for IP protection by buffer insertion technique
In this paper, we introduce a kind of watermarking system for IP protection (IPP). The copyright is encrypted and then embedded into the design as the watermark in buffer insertion stage. This watermarking technique can identify the design copyright uniquely, and is fit for both ASIC using standard cells and full-custom design. We have evaluated the technique on several testing designs, the inserted results show that the watermarking process achieves 100% success causing little overhead on design performance. Extraction and identification process of the watermark is also analyzed. The watermark embedded is hard to be found out and tampered away, and the technique can be integrated into EDA tools for manufacturing