用有限元模拟和响应面法确定BEOL铝铜本构方程

2019 20th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE) Pub Date : 2019-03-01 DOI:10.1109/EUROSIME.2019.8724582

R. Sethu, Hansika Jayawardana, K. Soon, A. Chai

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引用次数: 0

摘要

通过对纳米压痕实验数据和有限元分析(FEA)仿真数据的匹配，确定了采用物理气相沉积(PVD)工艺沉积的特定铝薄膜的本构方程模型。所使用的模型是由三个系数定义的voice各向同性硬化模型的导数。线性硬化系数为21937 MPa，饱和流变应力为135 MPa，饱和指数为25。

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Determination of BEOL Aluminum-Copper Constitutive Equation using FEA Simulation and Response Surface Methodology

The constitutive equation model for a particular aluminum thin film deposited using Physical Vapor Deposition (PVD) process used in wafer fabrication Back End of Line (BEOL) has been determined by matching the data from experimental nanoindentation and Finite Element Analysis (FEA) simulation. The model used is a derivative of the Voce isotropic hardening model which is defined by three coefficients. The Linear Hardening Coefficient, Saturation Flow Stress and Saturation Exponent has been determined to be 21937 MPa, 135 MPa and 25 respectively.

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来源期刊

2019 20th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE)

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