{"title":"用于热压键合的铜引线上减少镀金-第一部分:初始表征","authors":"N. Panousis, P. Hall","doi":"10.1109/TPHP.1977.1135201","DOIUrl":null,"url":null,"abstract":"In this two part series, Au-plated Cu leads with reduced Au thicknesses are evaluated for thermocompression (TC) bonding. Part I is concerned with initial characterization, which makes use of recent measurements of grain boundary diffusion coefficients (D') of Cu through Au. Part II considers the problem of predicting the long term reliability (40 years at 50°C) of these TC bonds, using recent measurements of the volume interdiffusion coefficients (D). Oxygen-free Cu leads plated with as little as 0.7 µm Au were compared to the more typical plating thickness of about 2.5 µm. The properties evaluated in Part I are: 1) initial TC bondability; and 2) prebond shelf life, i.e., TC bondability after storage of the Au-plated leads. Results of these evaluations are the following. 1) Leads plated with as little as 0.7 µm Au can have acceptable initial TC bond strengths especially when bonded at 30 to 50 percent deformation. 2) High-temperature storage of the leads followed by TC bonding indicates a shelf life of greater than two years at 50°C. This is in agreement with predictions based on grain boundary diffusion of Cu through Au: D' = 8 x 10-5exp (-0.91 eV/kT) [cm2/s]. Thus the initial characterization was successful for Au thicknesses down to 0.7 µm.","PeriodicalId":387212,"journal":{"name":"IEEE Transactions on Parts, Hybrids, and Packaging","volume":"43 3","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1977-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Reduced Gold-Plating on Copper Leads for Thermocompression Bonding-Part I: Initial Characterization\",\"authors\":\"N. Panousis, P. Hall\",\"doi\":\"10.1109/TPHP.1977.1135201\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this two part series, Au-plated Cu leads with reduced Au thicknesses are evaluated for thermocompression (TC) bonding. Part I is concerned with initial characterization, which makes use of recent measurements of grain boundary diffusion coefficients (D') of Cu through Au. Part II considers the problem of predicting the long term reliability (40 years at 50°C) of these TC bonds, using recent measurements of the volume interdiffusion coefficients (D). Oxygen-free Cu leads plated with as little as 0.7 µm Au were compared to the more typical plating thickness of about 2.5 µm. The properties evaluated in Part I are: 1) initial TC bondability; and 2) prebond shelf life, i.e., TC bondability after storage of the Au-plated leads. Results of these evaluations are the following. 1) Leads plated with as little as 0.7 µm Au can have acceptable initial TC bond strengths especially when bonded at 30 to 50 percent deformation. 2) High-temperature storage of the leads followed by TC bonding indicates a shelf life of greater than two years at 50°C. This is in agreement with predictions based on grain boundary diffusion of Cu through Au: D' = 8 x 10-5exp (-0.91 eV/kT) [cm2/s]. Thus the initial characterization was successful for Au thicknesses down to 0.7 µm.\",\"PeriodicalId\":387212,\"journal\":{\"name\":\"IEEE Transactions on Parts, Hybrids, and Packaging\",\"volume\":\"43 3\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1977-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Parts, Hybrids, and Packaging\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/TPHP.1977.1135201\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Parts, Hybrids, and Packaging","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TPHP.1977.1135201","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
摘要
在这个由两部分组成的系列中,我们评估了减少Au厚度的镀Au铜引线用于热压(TC)键合。第一部分涉及初始表征,它利用最近测量的Cu通过Au的晶界扩散系数(D')。第二部分考虑了预测这些TC键的长期可靠性(在50°C下40年)的问题,使用最近的体积相互扩散系数(D)的测量。将镀有0.7 μ m Au的无氧铜铅与更典型的镀厚度约2.5 μ m的铜铅进行了比较。第一部分评估的性质是:1)初始TC粘合性;2)预键合保质期,即镀金引线储存后的TC键合性。这些评价的结果如下。1)电镀0.7 μ m Au的引线具有可接受的初始TC结合强度,特别是当结合变形为30%至50%时。2)引线的高温储存和TC键合表明在50°C下的保质期大于两年。这与基于Cu通过Au的晶界扩散的预测一致:D' = 8 x 10-5exp (-0.91 eV/kT) [cm2/s]。因此,最初的表征是成功的,金的厚度低至0.7µm。
Reduced Gold-Plating on Copper Leads for Thermocompression Bonding-Part I: Initial Characterization
In this two part series, Au-plated Cu leads with reduced Au thicknesses are evaluated for thermocompression (TC) bonding. Part I is concerned with initial characterization, which makes use of recent measurements of grain boundary diffusion coefficients (D') of Cu through Au. Part II considers the problem of predicting the long term reliability (40 years at 50°C) of these TC bonds, using recent measurements of the volume interdiffusion coefficients (D). Oxygen-free Cu leads plated with as little as 0.7 µm Au were compared to the more typical plating thickness of about 2.5 µm. The properties evaluated in Part I are: 1) initial TC bondability; and 2) prebond shelf life, i.e., TC bondability after storage of the Au-plated leads. Results of these evaluations are the following. 1) Leads plated with as little as 0.7 µm Au can have acceptable initial TC bond strengths especially when bonded at 30 to 50 percent deformation. 2) High-temperature storage of the leads followed by TC bonding indicates a shelf life of greater than two years at 50°C. This is in agreement with predictions based on grain boundary diffusion of Cu through Au: D' = 8 x 10-5exp (-0.91 eV/kT) [cm2/s]. Thus the initial characterization was successful for Au thicknesses down to 0.7 µm.