{"title":"多输入/多输出,运行到运行控制器,用于精确和稳定的外延过程:APC:先进的过程控制","authors":"R. Benjamin, Lippl Gerhard, Lipp Stefan","doi":"10.1109/ASMC.2016.7491121","DOIUrl":null,"url":null,"abstract":"The development and usage of a Multiple in / Multiple out Run to Run Controller for complex epitaxy systems is the topic of this manuscript. The system uses dynamic status values and can be operated in two different modes. This allow to manufacture high accuracy epitaxial films.","PeriodicalId":264050,"journal":{"name":"2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"104 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Multiple in/Multiple out, run to run controller for accurate and stable epitaxy processes: APC: Advanced process control\",\"authors\":\"R. Benjamin, Lippl Gerhard, Lipp Stefan\",\"doi\":\"10.1109/ASMC.2016.7491121\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The development and usage of a Multiple in / Multiple out Run to Run Controller for complex epitaxy systems is the topic of this manuscript. The system uses dynamic status values and can be operated in two different modes. This allow to manufacture high accuracy epitaxial films.\",\"PeriodicalId\":264050,\"journal\":{\"name\":\"2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"104 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2016.7491121\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2016.7491121","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Multiple in/Multiple out, run to run controller for accurate and stable epitaxy processes: APC: Advanced process control
The development and usage of a Multiple in / Multiple out Run to Run Controller for complex epitaxy systems is the topic of this manuscript. The system uses dynamic status values and can be operated in two different modes. This allow to manufacture high accuracy epitaxial films.