{"title":"初始通孔阻力与可靠性性能的相关性","authors":"C. Graas, H. A. Le, T.A. Rosi","doi":"10.1109/RELPHY.1997.584233","DOIUrl":null,"url":null,"abstract":"Accelerated stressing and electromigration (EM) testing were conducted on W-plug via chains and Van der Pauw structures respectively. These populations were chosen to include a wide distribution of initial resistances R/sub 0/. The high-end of the R/sub 0/ distribution exhibited a higher early failure rate and a higher spread in EM time-to-fail distribution. Processes which produce tightly controlled time-zero via resistance distributions are more desirable for via reliability.","PeriodicalId":193458,"journal":{"name":"1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Correlations between initial via resistance and reliability performance\",\"authors\":\"C. Graas, H. A. Le, T.A. Rosi\",\"doi\":\"10.1109/RELPHY.1997.584233\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Accelerated stressing and electromigration (EM) testing were conducted on W-plug via chains and Van der Pauw structures respectively. These populations were chosen to include a wide distribution of initial resistances R/sub 0/. The high-end of the R/sub 0/ distribution exhibited a higher early failure rate and a higher spread in EM time-to-fail distribution. Processes which produce tightly controlled time-zero via resistance distributions are more desirable for via reliability.\",\"PeriodicalId\":193458,\"journal\":{\"name\":\"1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.1997.584233\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1997.584233","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
摘要
分别对w -塞通过链和Van der Pauw结构进行了加速应力和电迁移(EM)测试。这些种群的选择包括广泛分布的初始抗性R/sub 0/。R/sub 0/分布的高端在EM失效时间分布中表现出更高的早期故障率和更高的扩散。通过电阻分布产生严格控制的时间为零的工艺更适合于通过可靠性。
Correlations between initial via resistance and reliability performance
Accelerated stressing and electromigration (EM) testing were conducted on W-plug via chains and Van der Pauw structures respectively. These populations were chosen to include a wide distribution of initial resistances R/sub 0/. The high-end of the R/sub 0/ distribution exhibited a higher early failure rate and a higher spread in EM time-to-fail distribution. Processes which produce tightly controlled time-zero via resistance distributions are more desirable for via reliability.
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