SiC jfet在300/spl℃下的高温应力

C. Scozzie, C. W. Tipton, W. DeLancey, J. McGarrity, F. B. McLean
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引用次数: 5

摘要

碳化硅是一种重要的用于高功率和高温应用的新兴半导体技术。虽然文献中的许多论文报道了各种SiC器件的一些特性和优点,但很少有关于这些器件长时间测试和运行的信息。在我们的研究中,由CREE研究公司制造和封装了一批特殊的SiC jfet。这些设备被交付给陆军研究实验室,在那里进行了电气表征,辐射测试,并在各种偏压条件下承受300/spl度/C的热应力1000小时。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High temperature stressing of SiC JFETs at 300/spl deg/C
Silicon carbide is an important emerging semiconductor technology for high power and high temperature applications. Although many papers in the literature report some of the characteristics and advantages of various SiC devices, very little information is available on the test and operation of these devices for an extended period of time. For our study a special lot of SiC JFETs was fabricated and packaged by CREE Research Inc. These devices were delivered to the Army Research Laboratory where they have been electrically characterized, radiation tested and, as reported here, subjected to thermal stress at 300/spl deg/C for 1000 hours under various bias conditions.<>
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