HiSIM-SOI:完全基于表面电位的模型,适用于所有soi结构类型

M. Miura-Mattausch, S. Amakawa, M. Miyake, H. Kikuchihara, S. Baba, H. Mattausch
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引用次数: 6

摘要

提出了基于完整表面电位描述的紧凑SOI-MOSFET模型HiSIM-SOI。该模型考虑了器件中所有可能产生的电荷,并迭代求解了泊松方程。因此,HiSIM-SOI适用于从厚到极薄的SOI或BOX层的任何结构变化。完全耗尽和部分耗尽状态之间的动态耗尽得到了很好的再现。在泊松方程的求解中,考虑SOI层中电荷的累积,可以准确地捕捉到浮体效应。经过验证,HiSIM-SOI可以自动正确地重现不同soi结构类型的2d器件模拟结果,而无需任何额外的选项设置。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
HiSIM-SOI: Complete surface-potential-based model valid for all SOI-structure types
The compact SOI-MOSFET model HiSIM-SOI based on the complete surface-potential description is presented. The model considers all possible charges induced in the device for the formulation of the Poisson equation, which is solved iteratively. Thus HiSIM-SOI is valid for any structural variations from thick to extremely thin SOI or BOX layers. The dynamic depletion between the fully and partially depleted conditions is well reproduced. It is also demonstrated that the floating-body effect can be accurately captured by considering the accumulated charge in the SOI layer for the solution of the Poisson equation. HiSIM-SOI is verified to correctly reproduce 2D-device simulation results automatically for different SOI-structure types without any additional option setting.
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