Manabu Tomita, S. Mori, Y. Fukuzaki, K. Ogawa, S. Miyake, H. Ohnuma
{"title":"极低电压可操作的片上等离子体诱发损伤监测测试电路,采用高灵敏度环式vco(压控振荡器)","authors":"Manabu Tomita, S. Mori, Y. Fukuzaki, K. Ogawa, S. Miyake, H. Ohnuma","doi":"10.1109/ICMTS.2019.8730985","DOIUrl":null,"url":null,"abstract":"We developed an on-chip-monitor-test circuit that measures Vth fluctuation caused by plasma induced damage (PID) during wafer process with using a novel ring voltage controlled oscillator (Ring- VCO) at low Vdd operation condition. The circuit can be easily implemented to conventional design and applied to product test. We have demonstrated that the circuit fabricated by 28nm process can monitor Vth fluctuation due to PID with operating voltage at 0.5V, which can be used for low power IoT products by 28nm CMOS technology and beyond.","PeriodicalId":333915,"journal":{"name":"2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Extremely Low Voltage Operatable On-Chip- Monitor-Test Circuit for Plasma Induced Damage using High sensitivity Ring-VCO(Voltage Controlled Oscillator)\",\"authors\":\"Manabu Tomita, S. Mori, Y. Fukuzaki, K. Ogawa, S. Miyake, H. Ohnuma\",\"doi\":\"10.1109/ICMTS.2019.8730985\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We developed an on-chip-monitor-test circuit that measures Vth fluctuation caused by plasma induced damage (PID) during wafer process with using a novel ring voltage controlled oscillator (Ring- VCO) at low Vdd operation condition. The circuit can be easily implemented to conventional design and applied to product test. We have demonstrated that the circuit fabricated by 28nm process can monitor Vth fluctuation due to PID with operating voltage at 0.5V, which can be used for low power IoT products by 28nm CMOS technology and beyond.\",\"PeriodicalId\":333915,\"journal\":{\"name\":\"2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS)\",\"volume\":\"57 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2019.8730985\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2019.8730985","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Extremely Low Voltage Operatable On-Chip- Monitor-Test Circuit for Plasma Induced Damage using High sensitivity Ring-VCO(Voltage Controlled Oscillator)
We developed an on-chip-monitor-test circuit that measures Vth fluctuation caused by plasma induced damage (PID) during wafer process with using a novel ring voltage controlled oscillator (Ring- VCO) at low Vdd operation condition. The circuit can be easily implemented to conventional design and applied to product test. We have demonstrated that the circuit fabricated by 28nm process can monitor Vth fluctuation due to PID with operating voltage at 0.5V, which can be used for low power IoT products by 28nm CMOS technology and beyond.