用黏结区建模方法表征了温度对模具附着界面性能的影响

Xiaosong Ma, G. Zhang, O. van der Sluis, K. Jansen, W. V. van Driel, L. Ernst, C. Regard, C. Gautier, H. Frémont
{"title":"用黏结区建模方法表征了温度对模具附着界面性能的影响","authors":"Xiaosong Ma, G. Zhang, O. van der Sluis, K. Jansen, W. V. van Driel, L. Ernst, C. Regard, C. Gautier, H. Frémont","doi":"10.1109/ESIME.2010.5464533","DOIUrl":null,"url":null,"abstract":"Interface delamination is one of the most important issues in the microelectronic packaging industry. Silver filled die attach is a typical adhesive used between the die and copper die pad for its improved heat dissipation capacity. Delamination between die attach and die pad will severely impact the heat conduction and result in product failure. In order to predict this delamination, interface properties should be characterized. Tri-material, copper-die attach-EMC, samples are made according to the package processes. A four point bending test system is established in order to perform delamination tests at different temperatures using a universal tester Zwick/Roell Z005. In addition, a Keyence optical system is mounted to capture a series of pictures during the delamination processes. This will provide the delamination geometry information needed for determining the interface properties. Four point bending tests have been performed at room temperature, 40, 60, 85, and 150?C respectively. In addition pre conditioning sample are also tested at room temperature and 85?C respectively after 48 hours pre conditioned at 85?C/85%RH. Experiments show that the ?critical delamination load? decreases steadily with temperature increasing. Experiments also show moisture has no effects on the ?critical delamination load? compared with the dry samples tested at the same temperatures. This means that moisture has no effects on the interface toughness between copper and die attach. To quantify the interface properties, numerical simulations of the four point bending test have been performed by using a finite element model comprising cohesive zone elements which will describe the transient delamination process during the four point bending tests. Correspondently, the interface toughness decreases from 26.5J/m2 at room temperature to 1.9J/m2 at 150?C as calculated from the cohesive zone element model. These results show that temperature has a large effect on the interface toughness. By means of an extensive model parameter sensitivity study, combined with the measured delamination length in horizontal direction along the copper-die attach interface at room temperature critical opening value has been determined.","PeriodicalId":152004,"journal":{"name":"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)","volume":"148 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Die attach interface property characterization as function of temperature using cohesive zone modeling method\",\"authors\":\"Xiaosong Ma, G. Zhang, O. van der Sluis, K. Jansen, W. V. van Driel, L. Ernst, C. Regard, C. Gautier, H. Frémont\",\"doi\":\"10.1109/ESIME.2010.5464533\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Interface delamination is one of the most important issues in the microelectronic packaging industry. Silver filled die attach is a typical adhesive used between the die and copper die pad for its improved heat dissipation capacity. Delamination between die attach and die pad will severely impact the heat conduction and result in product failure. In order to predict this delamination, interface properties should be characterized. Tri-material, copper-die attach-EMC, samples are made according to the package processes. A four point bending test system is established in order to perform delamination tests at different temperatures using a universal tester Zwick/Roell Z005. In addition, a Keyence optical system is mounted to capture a series of pictures during the delamination processes. This will provide the delamination geometry information needed for determining the interface properties. Four point bending tests have been performed at room temperature, 40, 60, 85, and 150?C respectively. In addition pre conditioning sample are also tested at room temperature and 85?C respectively after 48 hours pre conditioned at 85?C/85%RH. Experiments show that the ?critical delamination load? decreases steadily with temperature increasing. Experiments also show moisture has no effects on the ?critical delamination load? compared with the dry samples tested at the same temperatures. This means that moisture has no effects on the interface toughness between copper and die attach. To quantify the interface properties, numerical simulations of the four point bending test have been performed by using a finite element model comprising cohesive zone elements which will describe the transient delamination process during the four point bending tests. Correspondently, the interface toughness decreases from 26.5J/m2 at room temperature to 1.9J/m2 at 150?C as calculated from the cohesive zone element model. These results show that temperature has a large effect on the interface toughness. By means of an extensive model parameter sensitivity study, combined with the measured delamination length in horizontal direction along the copper-die attach interface at room temperature critical opening value has been determined.\",\"PeriodicalId\":152004,\"journal\":{\"name\":\"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)\",\"volume\":\"148 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-04-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESIME.2010.5464533\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESIME.2010.5464533","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

接口分层是微电子封装行业中最重要的问题之一。充银模贴是一种典型的用于模具和铜模垫之间的粘合剂,它可以提高模具的散热能力。模贴与模垫之间的分层将严重影响热传导,导致产品失效。为了预测这种分层,需要对界面性质进行表征。三材料,铜模贴装- emc,按封装工艺制作样品。为了在不同温度下使用Zwick/Roell Z005通用试验机进行分层测试,建立了四点弯曲测试系统。此外,还安装了Keyence光学系统,以便在分层过程中捕获一系列图像。这将提供确定界面属性所需的分层几何信息。在室温、40℃、60℃、85℃和150℃下进行了四点弯曲试验。C分别。此外,预处理样品也在室温和85?在85℃/85%RH条件下预处理48小时后,分别为C。实验表明,临界脱层载荷为?随温度升高而稳定降低。实验还表明,水分对临界分层载荷没有影响。与在相同温度下测试的干燥样品进行比较。这意味着水分对铜和模具之间的界面韧性没有影响。为了量化界面特性,采用包含黏聚区单元的有限元模型对四点弯曲试验进行了数值模拟,该模型将描述四点弯曲试验期间的瞬态分层过程。相应的,界面韧性从室温时的26.5J/m2下降到150℃时的1.9J/m2。C由内聚区单元模型计算。结果表明,温度对界面韧性的影响较大。通过广泛的模型参数敏感性研究,结合在常温下沿铜模附着界面水平方向上的分层长度测量,确定了临界开度值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Die attach interface property characterization as function of temperature using cohesive zone modeling method
Interface delamination is one of the most important issues in the microelectronic packaging industry. Silver filled die attach is a typical adhesive used between the die and copper die pad for its improved heat dissipation capacity. Delamination between die attach and die pad will severely impact the heat conduction and result in product failure. In order to predict this delamination, interface properties should be characterized. Tri-material, copper-die attach-EMC, samples are made according to the package processes. A four point bending test system is established in order to perform delamination tests at different temperatures using a universal tester Zwick/Roell Z005. In addition, a Keyence optical system is mounted to capture a series of pictures during the delamination processes. This will provide the delamination geometry information needed for determining the interface properties. Four point bending tests have been performed at room temperature, 40, 60, 85, and 150?C respectively. In addition pre conditioning sample are also tested at room temperature and 85?C respectively after 48 hours pre conditioned at 85?C/85%RH. Experiments show that the ?critical delamination load? decreases steadily with temperature increasing. Experiments also show moisture has no effects on the ?critical delamination load? compared with the dry samples tested at the same temperatures. This means that moisture has no effects on the interface toughness between copper and die attach. To quantify the interface properties, numerical simulations of the four point bending test have been performed by using a finite element model comprising cohesive zone elements which will describe the transient delamination process during the four point bending tests. Correspondently, the interface toughness decreases from 26.5J/m2 at room temperature to 1.9J/m2 at 150?C as calculated from the cohesive zone element model. These results show that temperature has a large effect on the interface toughness. By means of an extensive model parameter sensitivity study, combined with the measured delamination length in horizontal direction along the copper-die attach interface at room temperature critical opening value has been determined.
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