烧结用于碳化硅基功率器件的Ag80-Al20纳米合金:斜坡速率和停留时间的影响

V. R. Manikam, K. A. Razak, K. Cheong
{"title":"烧结用于碳化硅基功率器件的Ag80-Al20纳米合金:斜坡速率和停留时间的影响","authors":"V. R. Manikam, K. A. Razak, K. Cheong","doi":"10.1109/IEMT.2012.6521743","DOIUrl":null,"url":null,"abstract":"The effects of sintering on Ag<sub>80</sub>-Al<sub>20</sub> nanopaste for use as a high temperature die attach material was studied. The sintering profile was fixed at 380°C, while the ramp rates and dwell times were varied at 5 to 10°C/min and 10 to 50 mins, respectively. It was shown statistically that dwell time had a more profound effect on the physical outcome of the sintered material. The post-sintered Ag<sub>80</sub>-Al<sub>20</sub> die attach material was analyzed for its electrical, thermal and mechanical properties. It demonstrated an electrical and thermal conductivity of 1.01 × 10<sup>-5</sup> (ohm-cm)<sup>-1</sup> and 123 W/m-K, respectively. Its melting point was determined at 518 ± 1°C, with an operational temperature of approximately 400°C. The low modulus of elasticity, E, at 9.8 GPa, matched the drop in values of hardness and stiffness as well, due to the formation of pores within the material. This altered the attributes of the die attach material. Its low CTE value at 7.74 × 10<sup>-6</sup>/°C is close to SiC which make it a suitable candidate for high temperature die attach applications.","PeriodicalId":315408,"journal":{"name":"2012 35th IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Sintering of Ag80-Al20 nanoalloy for high temperature die attach applications on silicon carbide-based power devices: The effects of ramp rate and dwell time\",\"authors\":\"V. R. Manikam, K. A. Razak, K. Cheong\",\"doi\":\"10.1109/IEMT.2012.6521743\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The effects of sintering on Ag<sub>80</sub>-Al<sub>20</sub> nanopaste for use as a high temperature die attach material was studied. The sintering profile was fixed at 380°C, while the ramp rates and dwell times were varied at 5 to 10°C/min and 10 to 50 mins, respectively. It was shown statistically that dwell time had a more profound effect on the physical outcome of the sintered material. The post-sintered Ag<sub>80</sub>-Al<sub>20</sub> die attach material was analyzed for its electrical, thermal and mechanical properties. It demonstrated an electrical and thermal conductivity of 1.01 × 10<sup>-5</sup> (ohm-cm)<sup>-1</sup> and 123 W/m-K, respectively. Its melting point was determined at 518 ± 1°C, with an operational temperature of approximately 400°C. The low modulus of elasticity, E, at 9.8 GPa, matched the drop in values of hardness and stiffness as well, due to the formation of pores within the material. This altered the attributes of the die attach material. Its low CTE value at 7.74 × 10<sup>-6</sup>/°C is close to SiC which make it a suitable candidate for high temperature die attach applications.\",\"PeriodicalId\":315408,\"journal\":{\"name\":\"2012 35th IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)\",\"volume\":\"19 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 35th IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEMT.2012.6521743\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 35th IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.2012.6521743","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

研究了烧结工艺对纳米Ag80-Al20作为高温模贴材料的影响。烧结温度为380℃,升温速率为5 ~ 10℃/min,停留时间为10 ~ 50 min。统计表明,停留时间对烧结材料的物理结果有更深远的影响。对烧结后的Ag80-Al20模具贴合材料进行了电学、热学和力学性能分析。其电导率和导热系数分别为1.01 × 10-5(欧姆-cm)-1和123 W/m-K。其熔点测定为518±1℃,工作温度约为400℃。由于材料内部孔隙的形成,低弹性模量E在9.8 GPa,与硬度和刚度值的下降相匹配。这改变了模具附加材料的属性。它的低CTE值为7.74 × 10-6/°C,接近SiC,使其成为高温模具附件应用的合适候选者。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sintering of Ag80-Al20 nanoalloy for high temperature die attach applications on silicon carbide-based power devices: The effects of ramp rate and dwell time
The effects of sintering on Ag80-Al20 nanopaste for use as a high temperature die attach material was studied. The sintering profile was fixed at 380°C, while the ramp rates and dwell times were varied at 5 to 10°C/min and 10 to 50 mins, respectively. It was shown statistically that dwell time had a more profound effect on the physical outcome of the sintered material. The post-sintered Ag80-Al20 die attach material was analyzed for its electrical, thermal and mechanical properties. It demonstrated an electrical and thermal conductivity of 1.01 × 10-5 (ohm-cm)-1 and 123 W/m-K, respectively. Its melting point was determined at 518 ± 1°C, with an operational temperature of approximately 400°C. The low modulus of elasticity, E, at 9.8 GPa, matched the drop in values of hardness and stiffness as well, due to the formation of pores within the material. This altered the attributes of the die attach material. Its low CTE value at 7.74 × 10-6/°C is close to SiC which make it a suitable candidate for high temperature die attach applications.
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