低温下注入诱导带隙缩小对双极晶体管的影响

J. Cressler, D. Tang, E. Yang
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引用次数: 5

摘要

作者提出的证据表明,注入诱导的带隙缩小在决定双极晶体管的低温特性中起着重要作用。用于研究的晶体管是缩放的双多晶硅自对准器件,在LN/sub 2/温度下产生低于200 pS的ECL(发射极耦合逻辑)门延迟。在大电流条件下,向器件的中性基区注入高密度的自由载流子,会出现带隙缩小现象;最终结果是低温电流增益的显著增强,这在传统器件理论中是无法解释的。为了精确的器件和电路建模,必须仔细考虑这种低温器件特性的扰动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effects of injection induced bandgap narrowing on bipolar transistors operating at low temperatures
The authors present evidence that injection-induced bandgap-narrowing plays an important role in determining the low-temperature characteristics of bipolar transistors. The transistors used for the investigation were scaled double-polysilicon self-aligned devices that have yielded sub-200 pS ECL (emitter coupled logic) gate delays at LN/sub 2/ temperature. The bandgap-narrowing phenomenon is shown to occur when a high density of free carriers is injected into the neutral base region of the device under high-current conditions; the net result is a significant enhancement in the low-temperature current gain that is unaccounted for in conventional device theory. This perturbation of the low-temperature device properties must be carefully considered for accurate device and circuit modelling.<>
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