汽车集成电路上模拟IOs的应力、测试和仿真

Chen He, S. Traynor, Gayathri Bhagavatheeswaran, H. Sánchez
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引用次数: 0

摘要

汽车集成电路对可靠性和质量的要求极高。随着输入/输出(IO)数据量的爆炸式增长,自动驾驶的先进技术节点上,越来越多的模拟IO焊盘被应用到汽车集成电路上,这对如何有效、安全地强化它们以满足汽车零缺陷(ZD)要求提出了独特的挑战。在本文中,我们提出了一种模拟多电压io的应力,测试和仿真方法,其中应力条件由电路级可靠性仿真确定,而硅应力结果用于与仿真模型相关联。讨论了16nm FinFET汽车微处理器上的硅结果,以证明我们的方法的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Stress, Test, and Simulation of Analog IOs on Automotive ICs
Automotive ICs (Integrated Circuits) demand extremely high reliability and quality requirements. On the advanced technology nodes to enable autonomous driving with exploding amount of input/output (IO) data, more and more analog IO pads have been implemented on the automotive ICs, which pose a unique challenge on how to effectively and safely stress them to meet automotive Zero Defect (ZD) requirement. In this paper, we present a stress, test and simulation methodology on analog multi-voltage IOs in which the stress conditions are determined by circuit level reliability simulation while silicon stress results are used to correlate to the simulation models. Silicon results on 16nm FinFET automotive microprocessor are discussed to demonstrate the effectiveness of our methodology.
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