采用BEOL互连的300mm通孔硅中间体(TSI)的成本研究

H. Li, G. Katti, Liang Ding, S. Bhattacharya, G. Lo
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引用次数: 8

摘要

成本一直是新技术应用的一个重要参数。通过Si Via (TSV)技术成为图像传感器应用的热点。我们根据我们的工艺流程和产量建立了成本模型,用于300mm TSI中间体的成本研究和降低。通过成本模型计算高成本区域。完整的TSI工艺流程分为TSV、BEOL、Top UBM、TDDB、BSR、BS rdl和Bump子工艺流程。从TSI工艺流程中确定了采用BEOL互连的2.5D TSI高成本子工艺流程。为每个高成本子流程流隔离了前三个流程模块。本文对高成本的工艺模块进行了分析和说明。在成本模型分析的基础上,提出了两种降低成本的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The cost study of 300mm through silicon interposer (TSI) with BEOL interconnect
The cost is always an important parameter for the new technical application. Through Si Via (TSV) technology becomes hot topic since image sensor application. We setup cost model according to our process flow and throughput for the cost study and reduction of 300mm TSI interposer. High cost area was calculated through the cost model. Full TSI process flow was separated as TSV, BEOL, Top UBM, TDDB, BSR, BS RDL& Bump sub-process flow. Top three high cost sub-process flow for 2.5D TSI with BEOL interconnect were identified from TSI process flow. Top three processes modules were isolated for each high cost subprocess flow. The high cost process modules were analyzed and explained in the paper. Two approaches were proposed for the cost reduction base on cost model analysis.
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