{"title":"降低TEM中光束敏感材料辐射损伤和增强图像对比度的成本和有效方法","authors":"Ching-Chun Lin, Kim Hsu","doi":"10.1109/ipfa.2018.8452568","DOIUrl":null,"url":null,"abstract":"The facile way to improve the image contrast of light element such as porous low-k material in TEM while preventing the sample from electron radiation damage was provided. Several experimental parameters were conducted to examine the contrast of oxide layer and damage level of the low-K material, which were monitored by the shrinkage amount of the layer thickness. The improved result can be reproduced successfully by controlling the thickness of the TEM lamella.","PeriodicalId":382811,"journal":{"name":"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"993 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Cost and Effective Way to Reduce Radiation Damage and Enhance Image Contrast of Beam Sensitive Materials in TEM\",\"authors\":\"Ching-Chun Lin, Kim Hsu\",\"doi\":\"10.1109/ipfa.2018.8452568\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The facile way to improve the image contrast of light element such as porous low-k material in TEM while preventing the sample from electron radiation damage was provided. Several experimental parameters were conducted to examine the contrast of oxide layer and damage level of the low-K material, which were monitored by the shrinkage amount of the layer thickness. The improved result can be reproduced successfully by controlling the thickness of the TEM lamella.\",\"PeriodicalId\":382811,\"journal\":{\"name\":\"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"volume\":\"993 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ipfa.2018.8452568\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ipfa.2018.8452568","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Cost and Effective Way to Reduce Radiation Damage and Enhance Image Contrast of Beam Sensitive Materials in TEM
The facile way to improve the image contrast of light element such as porous low-k material in TEM while preventing the sample from electron radiation damage was provided. Several experimental parameters were conducted to examine the contrast of oxide layer and damage level of the low-K material, which were monitored by the shrinkage amount of the layer thickness. The improved result can be reproduced successfully by controlling the thickness of the TEM lamella.