降低TEM中光束敏感材料辐射损伤和增强图像对比度的成本和有效方法

Ching-Chun Lin, Kim Hsu
{"title":"降低TEM中光束敏感材料辐射损伤和增强图像对比度的成本和有效方法","authors":"Ching-Chun Lin, Kim Hsu","doi":"10.1109/ipfa.2018.8452568","DOIUrl":null,"url":null,"abstract":"The facile way to improve the image contrast of light element such as porous low-k material in TEM while preventing the sample from electron radiation damage was provided. Several experimental parameters were conducted to examine the contrast of oxide layer and damage level of the low-K material, which were monitored by the shrinkage amount of the layer thickness. The improved result can be reproduced successfully by controlling the thickness of the TEM lamella.","PeriodicalId":382811,"journal":{"name":"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"993 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Cost and Effective Way to Reduce Radiation Damage and Enhance Image Contrast of Beam Sensitive Materials in TEM\",\"authors\":\"Ching-Chun Lin, Kim Hsu\",\"doi\":\"10.1109/ipfa.2018.8452568\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The facile way to improve the image contrast of light element such as porous low-k material in TEM while preventing the sample from electron radiation damage was provided. Several experimental parameters were conducted to examine the contrast of oxide layer and damage level of the low-K material, which were monitored by the shrinkage amount of the layer thickness. The improved result can be reproduced successfully by controlling the thickness of the TEM lamella.\",\"PeriodicalId\":382811,\"journal\":{\"name\":\"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"volume\":\"993 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ipfa.2018.8452568\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ipfa.2018.8452568","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

为提高多孔低k材料等轻元素在TEM中的成像对比度,同时防止样品受到电子辐射损伤提供了一种简便的方法。采用几个实验参数考察了低钾材料氧化层的对比度和损伤程度,并通过层厚度的收缩量来监测。通过控制TEM薄片的厚度,可以成功地再现改进的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Cost and Effective Way to Reduce Radiation Damage and Enhance Image Contrast of Beam Sensitive Materials in TEM
The facile way to improve the image contrast of light element such as porous low-k material in TEM while preventing the sample from electron radiation damage was provided. Several experimental parameters were conducted to examine the contrast of oxide layer and damage level of the low-K material, which were monitored by the shrinkage amount of the layer thickness. The improved result can be reproduced successfully by controlling the thickness of the TEM lamella.
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