Deyi Kong, Tongli Wei, Y. Li, Weidong Nie, W. Qian
{"title":"p型SiGe和n型Si之间异质结内置电压的简单而有意义的表达式","authors":"Deyi Kong, Tongli Wei, Y. Li, Weidong Nie, W. Qian","doi":"10.1109/HKEDM.1998.740196","DOIUrl":null,"url":null,"abstract":"In this work, the heterojunction built-in voltage between n-type Si and strained p-type SiGe is derived from their energy band diagrams, a simple and meaningful quantitative expression is presented. For unstrained SiGe, it reduces to a more simple expression, say, it can be simply determined by the built-in voltage of Si homojunction and the bandgap narrowing of SiGe. The expression is convenient in calculation.","PeriodicalId":183235,"journal":{"name":"Proceedings 1998 Hong Kong Electron Devices Meeting (Cat. No.98TH8368)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A simple and meaningful expression of heterojunction built-in voltage between p-type SiGe and n-type Si\",\"authors\":\"Deyi Kong, Tongli Wei, Y. Li, Weidong Nie, W. Qian\",\"doi\":\"10.1109/HKEDM.1998.740196\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, the heterojunction built-in voltage between n-type Si and strained p-type SiGe is derived from their energy band diagrams, a simple and meaningful quantitative expression is presented. For unstrained SiGe, it reduces to a more simple expression, say, it can be simply determined by the built-in voltage of Si homojunction and the bandgap narrowing of SiGe. The expression is convenient in calculation.\",\"PeriodicalId\":183235,\"journal\":{\"name\":\"Proceedings 1998 Hong Kong Electron Devices Meeting (Cat. No.98TH8368)\",\"volume\":\"47 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings 1998 Hong Kong Electron Devices Meeting (Cat. No.98TH8368)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/HKEDM.1998.740196\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 1998 Hong Kong Electron Devices Meeting (Cat. No.98TH8368)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HKEDM.1998.740196","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A simple and meaningful expression of heterojunction built-in voltage between p-type SiGe and n-type Si
In this work, the heterojunction built-in voltage between n-type Si and strained p-type SiGe is derived from their energy band diagrams, a simple and meaningful quantitative expression is presented. For unstrained SiGe, it reduces to a more simple expression, say, it can be simply determined by the built-in voltage of Si homojunction and the bandgap narrowing of SiGe. The expression is convenient in calculation.